• Scope of the Workshop

    This workshop is the 7th in a series devoted to plasma etch and strip processes for micro and nano- technologies. This year’s workshop also addresses new and challenging topics in the field of emerging nanoscale devices such as MEMS/NEMS, optronics devices and 3D Integration.

    The objective of the workshop is to provide a forum for open discussions between science and industrial application. It is dedicated to scientists, process engineers and Ph-D students.

    Topics include both fundamental and applied research, as well as issues related to introduction into manufacturing, with the progressive downscaling of device dimensions and the simultaneous demand for more functionality.

    Invited talks will be given by scientific and technical leaders in each of the key areas to present the current state-of-the-art and to stimulate technical discussions.

  • Key dates

    Final Announcement : December 21, 2013
    Abstracts are due : March 7, 2014
    March 20, 2014
    Notification of authors : March 31, 2014

  • For further information

    Registration Organization
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    Email : sebastien.barnola@cea.fr

       

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